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Cathodoluminescence study of ArF excimer laser-induced planarization of large grain diamond films

机译:ArF受激准分子激光诱导大晶粒金刚石薄膜平坦化的阴极发光研究

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摘要

Planarization of large grain diamond films has been induced by 193 nm excimer laser irradiation. Secondary emission images and cathodoluminescence (CL) in the scanning electron microscope have been used to characterize the irradiated area. Irradiation causes changes in the structure of defects involving nitrogen and vacancies. Evolution of the CL signal with the number of pulses indicates that the luminescence intensity tends to stabilize when a smooth film surface is obtained. © 1996 American Institute of Physics.
机译:193 nm受激准分子激光辐照已引起大晶粒金刚石膜的平面化。扫描电子显微镜中的二次发射图像和阴极发光(CL)已用于表征照射区域。辐照会导致缺陷结构的变化,包括氮和空位。 CL信号随脉冲数的变化表明,当获得光滑的膜表面时,发光强度趋于稳定。 ©1996美国物理研究所。

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